Open Call
ARA - Artist Residency Alcântara
Atelier HOLCNEROVA
Eligibility
Open to all disciplines
Number of Participants
Two double rooms and one single room.
Deadline
No deadline
Duration
November 01, 2018 - November 30, 2018
Costs
- €800.00 program fee
Facilities
Co-Working, Desk Space, Individual Studio, Installation Space, Shared Studio
Housing
Apartment, Kitchen, Live/Work, Private Room, Shared Bathroom
Meals
Coffee, Snacks, Tea
Public Programs
Exhibition, Open Studios, Performances, Readings, Retreat, Round Tables, Self-Directed, Work Exchange
Disciplines
Acting, Architecture, Ballet, Book Arts, Cartoonist, Choreography, Cinematography, Collective, Comedy, Conceptual Art, Crafts & Trades, Curatorial, Dance, Dance Groups, Design, Documentary, Drawing, Dreamers, Entrepreneur , Fiber Arts, Fiction, Film, Illustration, Installation, Interdiscplinary Arts, Intervention, Jewelry, Journalism, Literature, Makers, Multimedia, Nonfiction, Painting, Performance Art, Photography, Playwriting, Poetry, Research, Screenwriting, Singing, Social Practice, Start Up, Theatre, Thinkers, Video Art, Visual Arts, Web Design, Web Development
Languages
Czech, English, French, German, Greek, Italian, Persian, Portugese , Spanish, Ukrainian
Program Description
Alcantara Residency Program is a thematic residency focusing on providing a living working space for artists to experience the city. The location, the building itself and the neighborhood and its dynamics is expected to bridge an interaction between the various fields of artistic expression – visual arts, design, film, literature, media and performing arts – and architecture, generating discussion and collaboration between different artistic and technological platforms, through sharing the physical space of the building that is chosen, planned, reconstructed and designed to perfection by the team and members of Atelier HOLCNEROVA. The work developed is encouraged to be presented through exhibition, lecture, events, etc. but not required. We appreciate the process, the experience and your presence.