Open Call
TOKAS| Research Residency Program 2021
Tokyo Arts and Space
Eligibility
①Has considerable experience in his/her specialized area of expertise, and is expected to make good achievements in the near future. ② Has sufficient ability to communicate in English with other residing creators and TOKAS Residency staff for mutual understanding. ③ Independent and capable of working and living on his/her own. ④Creators working as a duo are also eligible. ⑤Students are ineligible (except Ph.D. candidates).
Number of Participants
10 (5 creators for each period) *Creators working as a duo are also eligible.
Deadline
Selection Results (Announcement Dates)
Duration
September 01, 2021 - March 31, 2022
Facilities
Desk Space, Library, Shared Studio
Housing
Apartment, Private Bathroom, Private Room
Meals
No meals
Disciplines
Architecture, Arts Administrator, Choreography, Composers, Conceptual Art, Curatorial, Documentary, Drawing, Film, Illustration, Installation, Interdiscplinary Arts, Moving Image, Music Composition, Painting, Performance Art, Photography, Research, Screenwriting, Sculpture, Sound Art, Theatre Directors, Video Art, Visual Arts
Languages
English, Japanese
Program Description
"Research Residency Program" gives opportunities to conduct research on arts and culture in the city of Tokyo, targeting both international and local creators in the field of visual art, film, design, architecture, music, sound art, performing art and curation. [Residency Period] 6 to 12 weeks within either of the following residency periods ①From the beginning of September, 2021 to the end of November, 2021 ②From the beginning of January, 2022 to the end of March, 2022 [What TOKAS offers] Living space (single room) * Accommodation will be provided for the participating creator only. A twin-bedded room will be provided to creators applying as a duo. *In principle, this program does not provide working studio for the participating creators. For more details>> https://www.tokyoartsandspace.jp/en/archive/application/2020/20200513-225.html
