Open Call

HONF Foundation Artist in Residency Program

HONF Foundation

No Funding
Yogyakarta, Indonesia


Artist, Technologist, Designer, Scientist, Engineer

Number of Participants

We accept application for individual and collective/team with minimum stay for one month and maximum six month. For collective artist/team, maximum of member is six. Residency Cost - 500 USD per month for individual applicant, include private double bedroom with air conditioner, private bathroom, publication, studio, and presenting the works. - 1800 USD per month for collective artist/team, include one house with private-share bedroom and bathroom, publication, studio, and presenting the works.


No deadline


October 31, 2018 - December 30, 2019


  • $500.00 program fee


Computer Lab, Conference Rooms, Co-Working, Desk Space, Fabrication Lab, Gallery, Installation Space, Large Format Printers, Print Shop, Shared Studio, Sound Studio, Wood Shop


Guest House, Home-Stay, Kitchen, Private Bathroom, Private Housing, Private Room, Shared Bathroom, Shared Room


Coffee, Tea, Vegan, Vegetarian

Public Programs

Community Engagement , Discussion, Exhibition, Forum, Group Dinners, Mural Projects, Open Studios, Panel, Performances, Pool Party, Professional Development, Publication, Readings, Round Tables, Schools, Self-Directed, Seminars, Visiting Professionals, Work Exchange, Workshops, Yoga


Activists, Animation, Architecture, Artificial Intelligence, Augmented Reality, Biotech, Ceramics, Chefs, Cinematography, Collective, Conceptual Art, Crafts & Trades, Culinary, Curatorial, Design, Digital Manufacturing, Digital Media, DJ / Nightlife, Documentary, Drawing, Dreamers, Fiber Arts, Film, Installation, Interdiscplinary Arts, Intervention, Land Art, Makers, Mixed Reality, Moving Image, Multimedia, Museum Technology, Painting, Pedagogy, Performance Art, Photography, Printmaking, Public Art, Research, Robotics, Scholar, Scientists, Sculpture, Social Practice, Sound Art, Tech, Textile, Thinkers, Video Art, Video Games, Virtual Reality, Visual Arts, Wearable Technology, Web Design, Web Development


English, Javanese

Program Description

Run by HONF Foundation - a laboratory for arts, science and technology, the AiR HONF Artist-in-Residence programme for international artist, technologist, designer, engineer and scientist is based on inter-disciplinary, collaboration and community based project, with the aim of building a dialogue, knowledge sharing, and fostering innovation between foreign artists and practitioners with local communities as well as looking for a creative solutions for today’s urgent needs through arts, science and technology. Resident artist receive a facility to work in HONFablab, the first Fablab in South East Asia with fully equipment, a studio, as well as to present their work at HONF’s Gallery. The artist in residency programme will do an arrangement for the resident artist to present their work publicly through exhibition, performance, projections, public discussions. Please send a cv, portfolio, and short description of your project to for applying this program.

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